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Visit USCOThe Formation of amorphous silicon by light ion damage Yih-cheng Shih
Text Registration
Copyright Title
The Formation of amorphous silicon by light ion damage Yih-cheng Shih
Status
Published
on 14 Jun 2007
Year of Creation
1985
Copyright Claimant
Yih-cheng Shih
Registration Number
TX0002047696
on 14 Jun 2007Copyright Summary
The U.S. Copyright record (Registration Number: TX0002047696) dated 14 Jun 2007, pertains to an electronic file (eService) titled "The Formation of amorphous silicon by light ion damage Yih-cheng Shih" created in 1985. The copyright holder is Yih-cheng Shih, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Yih-cheng Shih.
Application Details
Registration Number
TX0002047696
Registration Date
6/14/2007
Year of Creation
1985
Place of First Publication
Ann Arbor
Publisher Name
University Microfilms International
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
microfiche
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