Advanced Etch Technology for Nanopatterning IV [Published: 2015-04-23. Issue: vol. 9428, 23-25 February 2015]

Serial Registration

Advanced Etch Technology for Nanopatterning IV [Published: 2015-04-23. Issue: vol. 9428, 23-25 February 2015]

Status

Published

on 28 May 2015

Year of Creation

2015

SPIE

Registration Number

TX0008122176

on 28 May 2015

The U.S. Copyright record (Registration Number: TX0008122176) dated 28 May 2015, pertains to an electronic file (eService) titled "Advanced Etch Technology for Nanopatterning IV [Published: 2015-04-23. Issue: vol. 9428, 23-25 February 2015]" created in 2015. The copyright holder is SPIE, known for their creative contributions in serial registration. For any inquiries concerning this copyrighted material, kindly reach out to SPIE.

SPIE

Application Details

Registration Number

TX0008122176

Registration Date

5/28/2015

Year of Creation

2015

Agency Marc Code

DLC-CO

Record Status

New

Corporate Author

SPIE

First Publication Nation

United States

ISBN

9781628415308

Corporate Authors

SPIE

Notes

Rights Note: SPIE, PO Box 10, Bellingham, WA, 98227-0010, United States, (360) 676-3290

Copyright Local Holdings: vol. 9428, 23-25 February 2015 ISBN 9781628415308 Created 2015 Pub. 2015-04-23 Reg. 2015-06-08 TX0008122176 JMOO

Statements

Application Title Statement: Advanced Etch Technology for Nanopatterning IV

Author Statement: SPIE employer for hire Domicile: United States Citizenship: United States Authorship: contribution(s) to a collective work

Notes

Rights Note: SPIE, PO Box 10, Bellingham, WA, 98227-0010, United States, (360) 676-3290

Copyright Local Holdings: vol. 9428, 23-25 February 2015 ISBN 9781628415308 Created 2015 Pub. 2015-04-23 Reg. 2015-06-08 TX0008122176 JMOO

Statements

Application Title Statement: Advanced Etch Technology for Nanopatterning IV

Author Statement: SPIE employer for hire Domicile: United States Citizenship: United States Authorship: contribution(s) to a collective work

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