Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV [Published: 2011-02-07. Issue: vol. 7927, 25-26 January 2011]

Serial Registration

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV [Published: 2011-02-07. Issue: vol. 7927, 25-26 January 2011]

Status

Published

on 24 May 2011

Year of Creation

2011

SPIE

Registration Number

TX0007374998

on 24 May 2011

The U.S. Copyright record (Registration Number: TX0007374998) dated 24 May 2011, pertains to an electronic file (eService) titled "Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV [Published: 2011-02-07. Issue: vol. 7927, 25-26 January 2011]" created in 2011. The copyright holder is SPIE, known for their creative contributions in serial registration. For any inquiries concerning this copyrighted material, kindly reach out to SPIE.

SPIE

Application Details

Registration Number

TX0007374998

Registration Date

5/24/2011

Year of Creation

2011

Agency Marc Code

DLC-CO

Record Status

New

Corporate Author

SPIE

First Publication Nation

United States

ISBN

9780819484642

Corporate Authors

SPIE

Notes

Rights Note: SPIE, PO Box 10, Bellingham, WA, 98227-0010, United States, (360) 676-3290

Copyright Local Holdings: vol. 7927, 25-26 January 2011 ISBN 9780819484642 Created 2011 Pub. 2011-02-07 Reg. 2011-06-07 TX0007374998 JMOO

Statements

Application Title Statement: Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV

Author Statement: SPIE employer for hire Domicile: United States Citizenship: United States Authorship: Entire work

Notes

Rights Note: SPIE, PO Box 10, Bellingham, WA, 98227-0010, United States, (360) 676-3290

Copyright Local Holdings: vol. 7927, 25-26 January 2011 ISBN 9780819484642 Created 2011 Pub. 2011-02-07 Reg. 2011-06-07 TX0007374998 JMOO

Statements

Application Title Statement: Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV

Author Statement: SPIE employer for hire Domicile: United States Citizenship: United States Authorship: Entire work

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