Photomask and Next-Generation Lithography Mask Technology XVI [Published: 2009-05-08. Issue: vol. 7379, no. n/a, 8-10 April 2009]

Serial Registration

Photomask and Next-Generation Lithography Mask Technology XVI [Published: 2009-05-08. Issue: vol. 7379, no. n/a, 8-10 April 2009]

Status

Published

on 13 Aug 2009

Year of Creation

2009

SPIE

Registration Number

TX0007092318

on 13 Aug 2009

The U.S. Copyright record (Registration Number: TX0007092318) dated 13 Aug 2009, pertains to an electronic file (eService) titled "Photomask and Next-Generation Lithography Mask Technology XVI [Published: 2009-05-08. Issue: vol. 7379, no. n/a, 8-10 April 2009]" created in 2009. The copyright holder is SPIE, known for their creative contributions in serial registration. For any inquiries concerning this copyrighted material, kindly reach out to SPIE.

SPIE

Application Details

Registration Number

TX0007092318

Registration Date

8/13/2009

Year of Creation

2009

Agency Marc Code

DLC-CO

Record Status

New

Corporate Author

SPIE

First Publication Nation

United States

ISBN

9780819476562

Corporate Authors

SPIE

Notes

Rights Note: SPIE, PO Box 10, Bellingham, WA, 98227-0010, United States, (360) 685-5554, amys@spie.org

Copyright Local Holdings: vol. 7379, no. n/a, 8-10 April 2009 ISBN 9780819476562 Created 2009 Pub. 2009-05-08 Reg. 2009-07-06 TX0007092318 COWI

Statements

Application Title Statement: Photomask and Next-Generation Lithography Mask Technology XVI

Author Statement: SPIE employer for hire Citizenship: United States Authorship: Text

Notes

Rights Note: SPIE, PO Box 10, Bellingham, WA, 98227-0010, United States, (360) 685-5554, amys@spie.org

Copyright Local Holdings: vol. 7379, no. n/a, 8-10 April 2009 ISBN 9780819476562 Created 2009 Pub. 2009-05-08 Reg. 2009-07-06 TX0007092318 COWI

Statements

Application Title Statement: Photomask and Next-Generation Lithography Mask Technology XVI

Author Statement: SPIE employer for hire Citizenship: United States Authorship: Text

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