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Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV Phillip D. Blais, chairman/editor
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Copyright Title

Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV Phillip D. Blais, chairman/editor

Status

Published

on 14 Jun 2007
Year of Creation
1985
Registration Number
TX0001612029
on 14 Jun 2007

Copyright Summary


The U.S. Copyright record (Registration Number: TX0001612029) dated 14 Jun 2007, pertains to an electronic file (eService) titled "Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV Phillip D. Blais, chairman/editor" created in 1985. The copyright holder is Society of Photo-Optical Instrumentation Engineers, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Society of Photo-Optical Instrumentation Engineers.

Copyright Details


Application Details


Registration Number
TX0001612029
Registration Date
6/14/2007
Year of Creation
1985
Place of First Publication
Bellingham, Wash
Publisher Name
SPIE
Agency Marc Code
DLC-CO
Record Status
New
Corporate Author
Society of Photo-Optical Instrumentation Engineers Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies, 4th, Santa Clara, Calif., 1985
Physical Description
219 p
Series Statement
Proceedings of S P I E v. 537

Personal Authors


Notes


Bibliographic Note: Proceedings of the meeting held Mar. 14-15, 1985, in Santa Clara, Calif

Statements


Author Statement: Society of Photo-Optical Instrumentation Engineers, employer for hire
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