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Visit USCOElectron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI 11-13 Mar. 1996, Santa Clara, California David E. Seeger, chair/editor
Text Registration
Copyright Title
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI 11-13 Mar. 1996, Santa Clara, California David E. Seeger, chair/editor
Status
Published
on 14 Jun 2007
Year of Creation
1996
Copyright Claimant
Society of Photo-Optical Instrumentation Engineers (employer for hire)
Registration Number
TX0004335532
on 14 Jun 2007Copyright Summary
The U.S. Copyright record (Registration Number: TX0004335532) dated 14 Jun 2007, pertains to an electronic file (eService) titled "Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI 11-13 Mar. 1996, Santa Clara, California David E. Seeger, chair/editor" created in 1996. The copyright holder is Society of Photo-Optical Instrumentation Engineers (employer for hire), known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Society of Photo-Optical Instrumentation Engineers (employer for hire).
Copyright Details
Copyright Claimant
Society of Photo-Optical Instrumentation Engineers (employer for hire)
Application Details
Registration Number
TX0004335532
Registration Date
6/14/2007
Year of Creation
1996
Place of First Publication
Bellingham, WA
Publisher Name
SPIE
Agency Marc Code
DLC-CO
Record Status
New
Corporate Author
Society of Photo-Optical Instrumentation Engineers
Physical Description
412 p
Series Statement
SPIE proceedings series vol. 2723
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