Geometric Influence on Electronic Properties: Graphene with Antidots, Two-Dimensional Electron Gas and Three-Dimensional Carbon Nanostructures

Text Registration

Geometric Influence on Electronic Properties: Graphene with Antidots, Two-Dimensional Electron Gas and Three-Dimensional Carbon Nanostructures

Status

Published

on 20 Nov 2017

Year of Creation

2017

Lei Wang

Registration Number

TX0008504920

on 20 Nov 2017

The U.S. Copyright record (Registration Number: TX0008504920) dated 20 Nov 2017, pertains to an electronic file (eService) titled "Geometric Influence on Electronic Properties: Graphene with Antidots, Two-Dimensional Electron Gas and Three-Dimensional Carbon Nanostructures" created in 2017. The copyright holder is Lei Wang, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Lei Wang.

Lei Wang

Application Details

Registration Number

TX0008504920

Registration Date

11/20/2017

Year of Creation

2017

Agency Marc Code

DLC-CO

Record Status

New

Physical Description

Electronic Deposit

First Publication Nation

United States

Personal Authors

Lei Wang

Notes

Rights Note: Mark Dill, ProQuest-CSA, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements

Application Title Statement: Geometric Influence on Electronic Properties: Graphene with Antidots, Two-Dimensional Electron Gas and Three-Dimensional Carbon Nanostructures

Author Statement: Lei Wang Citizenship: China Authorship: text

Notes

Rights Note: Mark Dill, ProQuest-CSA, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements

Application Title Statement: Geometric Influence on Electronic Properties: Graphene with Antidots, Two-Dimensional Electron Gas and Three-Dimensional Carbon Nanostructures

Author Statement: Lei Wang Citizenship: China Authorship: text

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