Zinc-Based Photoresist for High-Resolution Euv (Extreme Ultraviolet) Lithography

Status

Published

on 11 Nov 2019

Year of Creation

2019

Kou Yang

Registration Number

TX0008811536

on 11 Nov 2019

The U.S. Copyright record (Registration Number: TX0008811536) dated 11 Nov 2019, pertains to an electronic file (eService) titled "Zinc-Based Photoresist for High-Resolution Euv (Extreme Ultraviolet) Lithography" created in 2019. The copyright holder is Kou Yang, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Kou Yang.

Kou Yang

Application Details

Registration Number

TX0008811536

Registration Date

11/11/2019

Year of Creation

2019

Agency Marc Code

DLC-CO

Record Status

New

Physical Description

Electronic file (eService)

First Publication Nation

United States

Personal Authors

Kou Yang

Notes

Rights Note: Mark Dill, ProQuest, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements

Application Title Statement: Zinc-Based Photoresist for High-Resolution Euv (Extreme Ultraviolet) Lithography

Author Statement: Kou Yang Citizenship: not known Authorship: text

Notes

Rights Note: Mark Dill, ProQuest, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600, disspub@proquest.com

Statements

Application Title Statement: Zinc-Based Photoresist for High-Resolution Euv (Extreme Ultraviolet) Lithography

Author Statement: Kou Yang Citizenship: not known Authorship: text

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