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Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses fundamental mechanisms and application to IC interconnect technology by Christopher L. Borst, William N. Gill, Ronald J. Gutmann
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Copyright Title

Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses fundamental mechanisms and application to IC interconnect technology by Christopher L. Borst, William N. Gill, Ronald J. Gutmann

Status

Published

on 14 Jun 2007
Year of Creation
2002
Copyright Claimant
Kluwer Academic Publishers
Registration Number
TX0005616299
on 14 Jun 2007

Copyright Summary


The U.S. Copyright record (Registration Number: TX0005616299) dated 14 Jun 2007, pertains to an electronic file (eService) titled "Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses fundamental mechanisms and application to IC interconnect technology by Christopher L. Borst, William N. Gill, Ronald J. Gutmann" created in 2002. The copyright holder is Kluwer Academic Publishers, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Kluwer Academic Publishers.

Copyright Details


Copyright Claimant
Kluwer Academic Publishers

Application Details


Registration Number
TX0005616299
Registration Date
6/14/2007
Year of Creation
2002
Place of First Publication
Boston
Publisher Name
Kluwer Academic
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
229 p
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