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Visit USCOChemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses fundamental mechanisms and application to IC interconnect technology by Christopher L. Borst, William N. Gill, Ronald J. Gutmann
Text Registration
Copyright Title
Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses fundamental mechanisms and application to IC interconnect technology by Christopher L. Borst, William N. Gill, Ronald J. Gutmann
Status
Published
on 14 Jun 2007
Year of Creation
2002
Copyright Claimant
Kluwer Academic Publishers
Registration Number
TX0005616299
on 14 Jun 2007Copyright Summary
The U.S. Copyright record (Registration Number: TX0005616299) dated 14 Jun 2007, pertains to an electronic file (eService) titled "Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses fundamental mechanisms and application to IC interconnect technology by Christopher L. Borst, William N. Gill, Ronald J. Gutmann" created in 2002. The copyright holder is Kluwer Academic Publishers, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Kluwer Academic Publishers.
Application Details
Registration Number
TX0005616299
Registration Date
6/14/2007
Year of Creation
2002
Place of First Publication
Boston
Publisher Name
Kluwer Academic
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
229 p
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