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Halogen-based plasma etching of novel field-effect transistor gate materials
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Copyright Title

Halogen-based plasma etching of novel field-effect transistor gate materials

Status

Published

on 10 Dec 2010
Year of Creation
2009
Copyright Claimant
Kasi Michelle Kiehlbaugh
Registration Number
TX0006707806
on 10 Dec 2010

Copyright Summary


The U.S. Copyright record (Registration Number: TX0006707806) dated 10 Dec 2010, pertains to an electronic file (eService) titled "Halogen-based plasma etching of novel field-effect transistor gate materials" created in 2009. The copyright holder is Kasi Michelle Kiehlbaugh, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Kasi Michelle Kiehlbaugh.

Copyright Details


Copyright Claimant
Kasi Michelle Kiehlbaugh

Application Details


Registration Number
TX0006707806
Registration Date
12/10/2010
Year of Creation
2009
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
Computer text data

Notes


Rights Note: Rights and permissions info. on CORDS appl. in CO
Local Copyright Note: Electronic registration

Statements


Author Statement: entire text: Kasi Michelle Kiehlbaugh
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