Directed self-assembly of high-chi block copolymers for advanced patterning applications

Text Registration

Directed self-assembly of high-chi block copolymers for advanced patterning applications

Status

Published

on 14 Feb 2017

Year of Creation

2016

Gabriela Alva

Registration Number

TX0008444756

on 14 Feb 2017

The U.S. Copyright record (Registration Number: TX0008444756) dated 14 Feb 2017, pertains to an electronic file (eService) titled "Directed self-assembly of high-chi block copolymers for advanced patterning applications" created in 2016. The copyright holder is Gabriela Alva, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Gabriela Alva.

Gabriela Alva

Application Details

Registration Number

TX0008444756

Registration Date

2/14/2017

Year of Creation

2016

Agency Marc Code

DLC-CO

Record Status

New

Physical Description

Electronic file (eService)

First Publication Nation

United States

Personal Authors

Gabriela Alva

Notes

Rights Note: Diana G Zajic, ProQuest-CSA, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600 xext77020, disspub@proquest.com

Statements

Application Title Statement: Directed self-assembly of high-chi block copolymers for advanced patterning applications

Author Statement: Gabriela Alva Citizenship: United States Authorship: text

Notes

Rights Note: Diana G Zajic, ProQuest-CSA, LLC, 789 E. Eisenhower Parkway, Ann Arbor, MI, 48108-3218, United States, (800) 521-0600 xext77020, disspub@proquest.com

Statements

Application Title Statement: Directed self-assembly of high-chi block copolymers for advanced patterning applications

Author Statement: Gabriela Alva Citizenship: United States Authorship: text

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