Text Registration
Copyright Title
Stochastic Impact of Defocus in EUV Lithography
Status
Unpublished
on 24 Jun 2020
Year of Creation
2020
Copyright Claimant
Frederick Chen
Registration Number
TXu002205244
on 24 Jun 2020Copyright Summary
The U.S. Copyright record (Registration Number: TXu002205244) dated 24 Jun 2020, pertains to an electronic file (eService) titled "Stochastic Impact of Defocus in EUV Lithography" created in 2020. The copyright holder is Frederick Chen, known for their creative contributions in text registration. For any inquiries concerning this copyrighted material, kindly reach out to Frederick Chen.
Application Details
Registration Number
TXu002205244
Registration Date
6/24/2020
Year of Creation
2020
Agency Marc Code
DLC-CO
Record Status
New
Physical Description
Electronic file (eService)
Notes
Rights Note: Frederick Chen, 507 Kaiyuan Rd., 23-6, North Dist. Tainan City, 70442, Taiwan, (886) 987-0582 x19, chen.t.fred@gmail.com
Statements
Application Title Statement: Stochastic Impact of Defocus in EUV Lithography
Author Statement: Frederick Chen 1968 Domicile: Taiwan Citizenship: United States Authorship: text, artwork
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